DMC4-RPP Series Reverse Pulse Plating Rectifier/Process Controller


– Precise Control of Plating Current Waveform
– EFORM Software Control of RPP Parameters and Plating Cycle
– Multi Stage Process with RPP or DC Current Control
– Total Amp-Hour Target Set Point per Program
– User Friendly GUI
– Process Data Collection and Storage


Available Models



(other sizes available on request)
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